Latest coordinate measuring machine Tenders | Government coordinate measuring machine Tenders

CTN :45292428

25 Jun, 2026 NA

Tiruvallur - Tamil Nadu

Tender For corrigendum : tender for supply of c18m260029 mto loading bay batch controller and flow meter for cpcl - mass flow meter coriolis ss316 3in 300 , digital control valve dcv , sov 2way normally close 20 watt ttl dcv , sov 2way normally open 20 watt ttl dcv , controller batch dl 6000 , earthing clamp w/pvc insul flexibl cable , earthing relay smart ground detector plus , installation & commissioning

CTN :45579358

27 Jun, 2026 NA

Panchkula - Haryana

Tender For providing of customized amc/cmc for pre-owned products - 3d coordinate measuring machine; accurate gauging & instruments pvt ltd; annual maintenance contract (amc); minimum 4 preventive maintenance visits during a year; no

Central Government/Public Sector

CTN :45147541

17 Jun, 2026 NA

Visakhapatnam - Andhra Pradesh

Tender For corrigendum : supply of coordinate measuring machine (cmm) (as per buyer specification)

CTN :45260024

17 Jun, 2026 NA

Bangalore - Karnataka

Tender For corrigendum : providing of calibration services - calibration of multi sensor 3d coordinate measuring machine- o inspect plus (vmm) for 3 years; as per scope of work; any other government approved labs / service provider; buyer premises (onsite),calibration services - calibration of multi sensor 3d coordinate measuring machine- o inspect plus (vmm) for 3 years; as per scope of work; any other government approved labs / service provider; buyer premises (onsite),calibration services - calibration of blue light based geometric measurement system-comet 5 m for 3 years; as per scope of work; any other government approved labs / service provider; buyer premises (onsite),calibration services - calibration of blue light based geometric measurement system-comet 5 m for 3 years; as per scope of work; any other government approved labs / service provider; buyer premises (onsite)

Central Government/Public Sector

CTN :45467531

15 Jun, 2026 NA

Chatra - Jharkhand

Tender For supply of mandatory spares for chemical dosing skids , mandatory spares for oxygen dosing skids - drive shaft cum worm , drive worm wheel , connecting rod plate , cross head guide bush , plunger , plug , oil seal , washer , gland nut , electronic transmitter , transmitter of all type, ranges & model no. (for measurement of pressure, differential pressure flow, level, etc). , pressure transmitter , differential pressure transmitter , level transmitter , temperature element , local indicators like temperature gauges, pressure gauges, differential pressure gauges, flow gauges, flow meter etc. , pressure gauge , pressure gauge , diff. pressure gauge , process actuated switch devices includes all type of pressure, differential pressure, flow, , temperature, differential temperature, level switch devices. , process connection piping (for impulse piping/tubing, sampling piping/tubing and air supply piping , applicable) , valves of all types & models , 2 way, 3 way, 5 way valve manifolds , fitting , measuring instrument , electronic transmitters , transmitter of all type, ranges & model no. (for measurement of pressure, differential pressure flow, level, etc). , level transmitter (ultrasonic / radar type) , temperature element , local indicators like temperature gauges, pressure gauges, differential pressure gauges, flow gauges, flow meter etc. , process actuated switch devices includes all type of pressure, differential pressure, flow, temperature, differential temperature, level switch devices. , pd type flow transmitters , any other instrument (if applicable) , process connection piping (for impulse piping/ , valves of all types & models , 2 way, 3 way, 5 way valve manifolds , fitting , purge meter , filter regulators , mass flow controller , control valves actuators & accessories , pneumatic & electro-hydraulic actuator assembly , valve trim (including cage, plug, stem, seat ring, guide busing etc.) , diaphragm 'o' rings seals etc, all types of make etc. , pressure gauges of all types of make, rating, etc. , solenoid valves (if applicable) , positioner unit (complete unit) , pneumatic air filter/regulator of each type, makes rating etc. , air lock relays

CTN :45433239

15 Jun, 2026 NA

Chandigarh - Chandigarh

Tender For providing of customized amc/cmc for pre-owned products - 3d coordinate measuring machine (3d cmm); 3d coordinate measuring machine (3d cmm); annual maintenance contract (amc); four-monthly; yes

CTN :45195704

20 Jun, 2026 NA

Jabalpur - Madhya Pradesh

Tender For corrigendum : supply of 3d coordinate measuring machine

CTN :45415777

15 Jun, 2026 NA

Hyderabad-T - Telangana

Tender For upgradation of global advantage - upgradation of global advantage (09.15.08) & global performance(07.10.07) 3d cnc coordinate measuring machines (as per technical specifications, scope of work, acceptance test plan and list of deliverables), upgradation of global advantage (09.15.08) & global performance(07.10.07) 3d cnc coordinate measuring machines

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis