Tender For multi target uhv sputtering system system should consist of deposition chamber and load lock chamber with ultra high vacuum. sputtering chamber should be provided with 6 sputter cathodes of dc. load lock chamber with a rf sputtering gun.
Tender For supply of spares parts and consumables for mbe system - shutter washer, nut, screw, al fol, mo nut, alu feuil, conrd thermcpl wre / terminal, screen fluo, uhv viewport and fluo screen, viewport shutter, fork sensor opto