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CTN :38930987 Due date: 03 Feb, 202503 Feb, 2025 NA
Location: Delhi - Delhi Delhi - Delhi
Tender For maskless lithography system with 9x9 wafer processing with 600 nm resolution

Central Government/Public Sector

CTN :38938445 Due date: 13 Feb, 202513 Feb, 2025 NA
Location: Delhi - Delhi Delhi - Delhi
Tender For electron beam lithography (ebl) system

Central Government/Public Sector

CTN :38518829 Due date: 23 Jan, 202523 Jan, 2025 NA
Location: Mandi - Himachal Pradesh Mandi - Himachal Pradesh
Tender For corrigendum : supply ofmaskless lithography exposure system and direct laser writer with accessories - maskless lithography exposure system , accessories compatible rsesist for 3d lithography exposure system , accessories uv based sensing devices , direct laser writer , accessories direct laser cutter , accessories pvd system
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