Tender For providing, installation, testing and commissioning of sub pump set 15000 gph x 91 mtr head and 100 kva voltage stabilizer along with allied works at tubewell no 12 boria for feeding water at tawi river front under sanjy 2026 (revex savings) - providing, installation, testing & commissioning of submersible pump set 15000 gph x 91 mtr head and 100 kva voltage stabilizer along with allied works at tubewell no 12 boria for feeding water at tawi river front under sanjy 2026 (revex savings)
Tender For supply, delivery and installation of automatic chlorinator with 100 ltr capacity pvc tank within existing kiosk box for feeding chlorine solution and other allied works at pump house no-ii under mominpur w/s scheme under emsd-i, phe. dte, dist. 24pgs(n).
Tender For rate contract for procurement of medical consumables at central pharmacy aiims bhopal - disposable neonatal ventilator circuit with humidified jar and heating coil disposable bubble cpap circuit -neonatal with humidified jar and heating wire absorbable gelatin sponge 80mm, 50mm, 10mm silicone gel surgical tape rayon based ram cannula, blue ram cannula, white ram cannula, green umbilical catheter 4 fr (transparent with pe 2 way luer cock with two color) suction catheter infant feeding tube with marking 5 fr infant feeding tube with marking 6fr triple lumen bionector, octopus extension infant feeding tube with marking 7fr cling drape nasal cpap assembly with bonnet, mask and interface small nasal cpap assembly with bonnet, mask and interface medium nasal cpap assembly with bonnet, mask and interface large et tube uncuffed 2 mm et tube uncuffed 2.5 mm et tube uncuffed 3 mm et tube uncuffed 3.5 mm et tube uncuffed 4 mm et tube uncuffed 4.5 mm et tube uncuffed 5 mm et tube uncuffed 5.5 mm et tube uncuffed 6 mm pediatric urine collection bag phototherapy eye band medium phototherapy eye band large disposable breast pump disposable feeding pump for neonates ecg electrode neonates
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis
Tender For repairing and overhauling of clear waterpumpingmachinery (set - 3) at glr-2( block- d.h. 2) of falta mathurapur mega water supply project under under smd, phe dte.