Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis
Tender For supply of spares for kosan carousel and allied equipment at pune bp : : - load cell module mkiv 1loadcell , pcb cuc mkiii hmi-ctrl , pt pd transmitter new type , travelling wheel , pcb, cuc mkiv hmi-ctrl , data monitoringsystem for vision upgradation cpu , service kit for gas stop , main bell
Tender For supply of spares for excitation system at vhep, hosangadi-576282 - voltage monitoring relay 3 ph, dc-dc converter (output 24vdc), ac contactor 230 v mnx-32, synch check relay, ofc patch cord st-lc, anti vibration mounts
Tender For supply, installation testing and commissioning of smps based integrated power supply (ips) to suit rdso specification no. rdso/spn/165/2023 (version 4.0) or latest with 300ah low maintenance lead acid battery with complete accessories e.g spd, status monitoring panel, tools kit and essential spares (used in ei system at boe) [ warranty period: 30 months after the date of delivery ]
Tender For amtc of ephs in 15 mld stp ue kurukshetra supply of online data transfer to cpcb and hspcb server for existing system of waterqualitymonitoringsystems parameter is bod cod tss ph and etc of 15 mld stp kurukshetra complete all other work contingent
Tender For supply, installation testing and commissioning of smps based integrated power supply (ips) to suit rdso specification no. rdso/spn/165/2023 (version 4.0) or latest with 300ah low maintenance lead acid battery with complete accessories e.g spd, status monitoring panel, tools kit and essential spares (used in ei system at boe) [ warranty period: 30 months after the date of delivery ]
Tender For estimate for upgradation works including odor control system, solar power plant, online waterqualitymonitoringsystem, cctv surveillance, and flow meter at 10 mld stp, alapur, phed division no. 3 palwal under jal hi amrit initiative of amrut 2.0
Tender For estimate for upgradation works including odor control system, 70 kw solar power plant, online waterqualitymonitoringsystem, cctv surveillance, and flow meter at 15 mld stp, jodhpur road, phed division no. 3 palwal under jal hi amrit initiative of