Tender For inviting tenders for multitarget uhv sputtering system with two chambers main and rf with load lock. atleast 10-8 pa in main chamber is needed.
Tender For supply of fist grant instruments c c - raman spectrometer , photoluminescence spectrofluorometer with integrating sphere , sputtering system , alumina crucibles , silicon wafers
Tender For supply and installation of ultra high vacuum magnetron reactive co-sputtering system - main item, supply and installation of ultra high vacuum magnetron reactive co-sputtering system(detailed specifications and requirements as per annexure-a), amc for 1st year, amc for 2nd year, amc for 3rd year