Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis
Tender For supply of led bulb 9 watt , bulb holder , flood light 100 watt , watter taps ss , ball valve 0.75 inch , union gi 0.75 inch , electric wire 1 mm
Tender For supply of rotating assembly 13moc part no sct20058213mocsubrua2 , casing wear ring moc cf8m part no 190cf8m , neck ring ss part no sct20058219201232 , interstage ring part no sct200582cf8m204 , gland ss part no sct20058222300232 , interstage bush ss part no sct20058231300232 , spacer bush ss part no sct20058220100232 , split lantern bush ss part no sct20058222700112 , water defelctor steel part no sct20058223600251 , vent valve ss part no sct2005824500011 , bearing housing unit part no sct200582sssubbhusct582 , flexible piping for sealing aisi 316 part no sct200582aisi316560
Tender For supply of raw material, fabrication and installation of oil separation system for main helium compressor system outlet at mpdd - fabrication of high pressure housing made from ss 304l with replaceable filter element to remove oil from gas pressurization system operating at 27 bar as per detailed technical specification provided in section v, fabrication of 4 inch common header inlet and outlet for housing including sight glass drain line and its valve as per detailed technical specification provided in section v, generation of reports,installation,testing of and commissioning of the as per detailed technical specification provided in section v
Tender For purchase of instrumentation and control engineering practices (equipment) - motorized control valve trainer kit signal input:4 20 ma or 0 5 v valve characteristic:equal percentage stem movement:maximum 10 mm or 12 mm body material:cast iron trim material:ss 316 trim size: cv value:2 or 5 actuator:servo motor supply voltage:230 v ac, 50 hz connection: flanged or screwed type. digital indicator provided potentiometer provided for varying the 4 20 ma input signal, saybolt viscometer apparatus glass type: high-quality borosilicate glass tube. control type: manual energy regulator control. shape: rectangular bath with cylindrical test chamber. temperature range: ambient to 240 c oil bath temperature. humidity: up to 80% rh (non-condensing). power supply: 230 v ac, 50 hz. measuring range: 32 to 1000 sus(saybolt universal seconds). accuracy: as per astm d-88( 0.2 seconds). mounting type:benchtop. capacity:one cup(approximately 60 ml). control mode:manual operation. port size:standard orifice sizeas per astm d-88. features:oil bath with heater,thermoregulator,insulated outer body,orifice,receiver flask, control valve trainer kit three pneumatic control valves provided with individual hand valves valve characteristics: i) quick opening ii) linear iii) equal percentage. valves connected in parallel configuration for comparative study. pneumatic operation with air supply connection. control valve assembly mounted on trainer panel. power supply: 230 v ac, 50 hz., water level measurement trainer kit using capacitive type transducer tabletop model with transparent acrylic tank of approximately 50 cm height. capacitive type level sensor for continuous level measurement. sensor output: (4 20)ma and/or (0 5)v with built-in signal conditioning. vertical pump for water circulation from sump to tank. flow control valve, overflow, and drainage arrangement. digital display for water level indication in cm. power supply: 230 v ac, 50 hz, single phase. in-built regulated dc power supply for sensor and control circuit. mounted on powder-coated ms frame for laboratory use. suitable for calibration and study of capacitive level measurement.