Electron Spin Resonance Tenders

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State Government

CTN :45342663

10 Jun, 2026 NA

Itanagar - Arunachal Pradesh

Tender For purchase of equipment for the department of physics--- weight box (gm weight & milligram weight), simple pendulum (bob), young modulus, voltmeter (0-10 volt dc), galvanometer (0-30), voltmeter dc (0-3 volt), battery eliminator (power supply, dc output, 2-12 vol 750ma), post-office box, tangent galvanometer (50 turns coil), spherometer, led and laser diode characteristics apparatus, hybrid parameters of transistor, tomcats pendulum , bar pendant , damping oscillation in various mediums , thermal expansion apparatus , reported apparatus , archimedes principle apparatus , biot-savart law apparatus , photodiode characteristics apparatus , ldr characteristics apparatus, tunnel diode characteristics apparatus, rc coupled amplifier kit, rc phase shift oscillator using opamp, deflection magnetometer set, opamp kit, surface tension by capillary rise, co-efficient of viscosity by poiseuille's method., co-efficient of viscosity by stokes law with photogate, lcr series resonance apparatus, lcr parallel resonance, spring constant set, laser red for diffraction, laser green for diffraction, laser violet blue for diffraction, grating with different grating constant, vibration magnetometer, hall effect apparatus, bh curve tracer, quincks method, piezoelectric transducer kit, mercury lamp, fresnel's biprism diffraction apparatus, bread board with power supply, balmer series and rydberg constant set up, hydrogen discharge tubes for the rydberg constant set up, mercury lamp, michelson interferometer with light source, fresnel bi-prism complete set-up with sodium source, set-up for millikan's oil drop experiment, set-up for de-broglie wavelength. measurement, zeeman effect, lattice parameter se, electron spin resonance , fourier analysis kit , microwave bench set up

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

State Government

CTN :45135824

25 May, 2026 82.38 Lacs

Belagavi - Karnataka

Tender For supply, installation and commissioning of basic and applied science laboratory equipment to rani channamma university, belagavi under pm-usha meru scheme - digital hd microscope, digital water and soil analysis kit, high power metallurgical and medical teaching comparison microscope, student microscope economy model with triple revolving nosepiece, pid controlled oven, determination of planks constant be means leds, frank-hertz experiment kit, advanced four probe method to determine the energy gap of semiconductors, hall effect experiment kit, diodes characteristics and boltzmann constant, study of dielectric constant kit, electron spin resonance (esr) kit, basic tabletop nmr, hall effect in metal, millikans oil drop apparatus, apparatus for the study of photo electric effect (plancks constant), b-h curve/magnetic hysteresis curve experiment , screen based apparatus for ultrasonic diffraction, quinckes method, spectrometer for radiation detection, temp controllable magnetic stirrer , analytical weighing balance, water baths capacity 5 liters temperature range, centrifugate machine benchtop centrifuge, fume hood airflow 200 to 400 cfm face, single distilled water plant dist, hot air oven , digital oil bath , stage micrometre with eyepiece stage micrometre, compound three eye optical microscope, advanced fingerprints development kit, master questioned documents kit, td forensic tool kit, apis detector, biometrics sensors with sdk, advanced manual rotary microtome, study of x-ray diffraction simulation, electron phonon coupling experiment kit, study of energy bandgap and diffusion potential of pn-junction, multichannel analyser , thin film spectroscopic reflectometer, hand held gps, total station (ets), uav (drone) surveying and mapping

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