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Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis
Tender For supply of piston set with pin and lock , piston ring set , main bearing , big end bearing , thrust washer , connecting rod bush , engine overhauling gasket with o ring and head gasket , inlet and exhaust valve , inlet and exhaust valve guide , inlet and exhaust valve seat , inlet and exhaust valve oil seal , front and rear crank shaft oil seal , inlet and exhaust rocker , chain tensioner set of 02nos , chain tensioner protector with lock set of 05nos , oil pump assy , water pump assy with pully , fan belt , fan belt tensioner , injectors with o ring , clutch plate , pressure plate , flywheel crank shaft pilot bearing , clutch cylinder lower and upper with adaptor , clutch cylinder upper , rubber hose pipe complete set with clamp , oil filter , diesel filter , air filter , ac filter , exhaust manifold stud 12no , turbo charger assy with gasket , inter cooler cover stud with bolt , benjo washer 12 14 17 19 22 no , thermostat valve , temprature sending unit , oil sending unit , heater plug , engine dummy plug , engine mounting left side , l key 14 no , valve grinding stick big and small , steel cleaning brush big and small , grinding paste , nut bolt 10 no , nut bolt 12 no , wiper blade ) /bid number : gem/2026/b/7555899 * /dated: 18-05-2026 & & / bid document 1 / 36
Tender For bid to ras providing of design installation and maintenance of educational lab/centre - vocational lab; supply and installation of hardware; buyer -applicator brush hydraulic arm chair with footrest blackhead remover body massage bed bowles curling iron (curling tong) cutting scissors wax heater dustbin exfoliation machine eyebrow pencil sharpener facial steamer foot scraper foot spa galvanic machine hair dryer hairsteamer hand mirrors infrared lamp jumbo rollers set large stools magnifying glass make up palate manicure/pedicur e set manicure table measuring cup and spoon sets measuring glass sets 2 modular mirrors