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Central Government/Public Sector

CTN :45263257 Due date: 23 Jun, 202623 Jun, 2026 NA
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

CTN :45245157 Due date: 02 Jun, 202602 Jun, 2026 97.01 Lacs
Tender For supply along with service support of the of forbes marshall make spares of the swas system and supply of spares for the oxygen analyzer oxitec 5000 for unit # 1 to 4, ctpp, chhabra - ph measurement, ph sensor model (fm1104) range: 0-14, 05meter connecting cable includedmake : forbes marshall pvt. ltd.model : fm1104 cable : 5m connecting cable included, buffer amplifier for ph sensor fm1104 with 6 core cable 30 mmake-forbes marshall, dual channel ph analyser with controller and display make-forbes marshall,model-aqua4trans,transmitter : 4-wire 2 channel aqua4trans,part no. a4t-p-0-1-1-1-00, output : 4-20ma, ph buffer solution for ph 7 and ph 9.21 , 500 ml each, conductivity measurement, specific conductivity sensormake- forbes marshall,part no. - fgf4wfm8311, cation conductivity sensormake- forbes marshall,part no. - fgf4wfm8310, cable for conductivity elctrode fm831x length 15 mtr make- forbes marshall,part no. -fgf4wm4e-ccable15m, dual channel conductivity analyser with controller and display, aqua 4 trans 4 wire dual channel conductivity analyser with controllerand display (k 0.1)make - forbes marshall , transmitter 4 wire 2 channel aqua4-trans 1 nos, part no:a4t-p-0-3-3-1-00 , output 4-20 ma, aqua 4 trans 4 wire dualchannel conductivity analyser withcontroller and display k 0.01)make : forbes marshalltransmitter : 4-wire 2 channel aqua4trans-1 no.part no. a4t-p-0-3-3-1-00output : 4-20ma, sampling accessories, high pressure isolation globe valvemake-forbes marshal,model no. vkinm11.2500.1/2:17.41,s.n. fgi 815, high pressure reducermake-forbes marshal,part no. c4w-relisafe-prf4w2011570,as per asme ptc 19.11 standard,moc:ss316,end connections:1/4" od, back pressure regulatormake-forbes marshal,part no. fgf4w2011720, spares of the oxygen analyzer oxitec 5000, thermocouple with sleeve tube for o2 probe kes5003part no. :- c4n-kes5003tc, oxygen measuring zirconia cell for o2 probe kes5003part no. :- :-c4n-zo2-0002zro2 oxygen measuring cell (for safe probes)complete with gasket and va screws p/n. zo2-0001, heater for o2 probe kes5003internal part no. :- c4n-5003heater, probe heater with inconel covering for kes5003probe, p/n.hei-2003, ceramic filter for o2 probe kes5003part no. :- c4n-o2-spares-00111,o2 analyzer,spares,part ofprobe,basalt filter with cement,for highdust application, protection pipe for o2 probe kes5003part no. :- c4n-o203-c11x,o2 analyser,protection tube suitable forkes2003 & kes5003 probe,4processconnection,ss316l,with suitable site flangeand gasket, sov for o2 probe kes5003part no. :- c4n-solvalve,test gas electrosolenoid valve for auto calibration,110 vac supply operated

CTN :44612003 Due date: 07 Apr, 202607 Apr, 2026 3.59 Lacs
Tender For supply of gas chromatography spares d d - cic make gas chromatography model dhruva, temperature controller , cic make gas chromatography model dhruva, ssr 25amp dc to ac , cic make gas chromatography model dhruva, mol sieve 5a column , cic make gas chromatography model dhruva, heater coil , cic make gas chromatography model dhruva, tc-k sensor , cic make gas chromatography model dhruva, spares installation and commissioning charges , cic make gas chromatography model dhruva,tcd amplifier pcb
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