Latest industrial oxygen Tenders | Government industrial oxygen Tenders

Central Government And Public Sector

CTN :45513500

25 Jun, 2026 NA

Damanjodi - Odisha

Tender For supply of industrial da gas , industrial oxygen gas

Central Government/Public Sector

CTN :45261457

17 Jun, 2026 NA

Bharuch - Gujarat

Tender For corrigendum : supply of industrial oxygen gas , industrial acetylene gas

Central Government/Public Sector

CTN :45478481

18 Jun, 2026 NA

Nagpur - Maharashtra

Tender For supply of m1060100280-industrial oxygen gas 99 percentage pure is 309 , hydrostatic stretch testing and permanen , replacement of valve , replacement of valve guard-cylinder cap , replacement of spindle , replacement of gland nut , replacement of cylinder ring , painting and de- greasing charges

CTN :45370220

15 Jun, 2026 NA

Multi City - Multi State

Tender For providing of custom bid for services - refilling of industrial oxygen gases in cylinders

State Government

CTN :45353021

18 Jun, 2026 NA

Kheda - Gujarat

Tender For supply of industrial oxygen (o2), dissolved acetylene (da) and nitrogen (n2) gas in cylinders at wanakbori t.p.s.

State Government

CTN :45345784

06 Jun, 2026 NA

Allahabad - Uttar Pradesh

Tender For supply of industrial oxygen gas , industrial carbon dioxide gas

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

CTN :45303213

13 Jun, 2026 NA

Khammam-T - Telangana

Tender For supply of refilling and safe delivery of industrial nitrogen gas of 99 decimal 9 percent purity in empty door collected departmental cylinders from hwpm, capacity of each cylinder is 7 cubic meter , refilling and safe delivery of industrial oxygen gas in empty door collected departmental cylinders from hwpm, capacity of each cylinder is 7 cubic meter , refilling and safe delivery of industrial dissolved acetylene gas of 99 decimal 8 percent empty door collected departmental cylinders from hwpm, capacity of each cylinder is 6 cubic meter , refilling and safe delivery of argon gas of 99 decimal 95 percent purity as per is 5780 ratio 1993 empty door collected departmental cylinders from hwpm, capacity of each cylinder is 7 cubic meter , painting charges per cylinder , hydraulic testing charges per cylinder , replacement and fixing of valve , replacement and fixing of valve spindle , replacement and fixing of gland nut , replacement and fixing of valve guard

Central Government/Public Sector

CTN :45267595

01 Jun, 2026 NA

Nandurbar - Maharashtra

Tender For supply of industrial oxygen gas cylinder, indigenous empty high pressure seamless steel gas cylinder [ warranty period: 30 months after the date of delivery ] ]

corporations/Associations/Others

CTN :45011285

18 May, 2026 NA

Luckwada - Chhattisgarh

Tender For corrigendum : supply of 1700005089 industrial oxygen gas in 7 cum cylinder , 1700005090 dissolved acetylene in 7 cum cylinder , 1700005091 nitrogen gas in 7 cum cylinder , 1700006117 medical oxygen gas 1point5 cum per cylinder , 1700008788 nitrous oxide gas in cylinder 1780l , 1700005092 argon gas in 7 cum cylinder , 1700008789 medical carbon dioxide gas 1point5 cum per cylinder , 1700008790 medical oxygen gas in 7 cum cylinder , 1700043811 medical oxygen in cylinder 0point75 cum per cylinder

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