Latest nitrous gas Tenders | Government nitrous gas Tenders

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

Central Government/Public Sector

CTN :45326201

05 Jun, 2026 NA

Visakhapatnam - Andhra Pradesh

Tender For rate contract for acm mixture gas argon 90 and co2 10

Central Government/Public Sector

CTN :45331268

05 Jun, 2026 NA

Haridwar - Uttarakhand

Tender For supply of uhp argon gas

Central Government/Public Sector

CTN :45337038

03 Jun, 2026 NA

Gandhidham - Gujarat

Tender For supply of shield gas-mixture for mig/mag welding purpose consisting of 95-99% argon gas to specification is 5760/1998 or latest grade 3 & 1-5% oxygen gas to specification is 309-2005 or latest, filled in cylinders with capacity of 11.3 cum and maximum working pressure of 230 bar with purity certificate and as per the safety requirements furnished in the annexure attached. [ warranty period: 30 months after the date of delivery ] ]

Central Government/Public Sector

CTN :45337196

15 Jun, 2026 NA

Dahod - Gujarat

Tender For supply of argon gas + (1-5%) o2 gas for ss welding as per is:5760-1998 gr-3, cylinder of 7/7.5 cubic meter, cylinder pressure 130 t0 150 kg/cm2 per cylinder. [ warranty period: 30 months after the date of delivery ] ]

CTN :45303213

13 Jun, 2026 NA

Khammam-T - Telangana

Tender For supply of refilling and safe delivery of industrial nitrogen gas of 99 decimal 9 percent purity in empty door collected departmental cylinders from hwpm, capacity of each cylinder is 7 cubic meter , refilling and safe delivery of industrial oxygen gas in empty door collected departmental cylinders from hwpm, capacity of each cylinder is 7 cubic meter , refilling and safe delivery of industrial dissolved acetylene gas of 99 decimal 8 percent empty door collected departmental cylinders from hwpm, capacity of each cylinder is 6 cubic meter , refilling and safe delivery of argon gas of 99 decimal 95 percent purity as per is 5780 ratio 1993 empty door collected departmental cylinders from hwpm, capacity of each cylinder is 7 cubic meter , painting charges per cylinder , hydraulic testing charges per cylinder , replacement and fixing of valve , replacement and fixing of valve spindle , replacement and fixing of gland nut , replacement and fixing of valve guard

Central Government/Public Sector

CTN :45335198

01 Jun, 2026 NA

Jhansi - Uttar Pradesh

Tender For supply of argon gas + (1-5%) oxygen gas for ss welding. delivery in firm's returnable cylinder without any rent to our destination . capacity of cylinder 07 cubic metre. specn: as per irs m-46 (indianrailways standard specification for classification, testing and acceptance criteria of filler wires for mig/mag welding)table-1 sr. no. 6 argon gas +(1-5%) oxygen gas for ss welding. delivery in firm's returnable cylinder without any rent to our destination . capacity of cylinder 07 cubic metre. [ warrantyperiod: 30 months after the date of delivery ][quantity tolerance (+/-): 5 %age , item category : normal , total po value variation permitted: max 8 lacs ] ]

CTN :45336510

29 Jun, 2026 NA

Liluah - West Bengal

Tender For supply of shielding gas (each cylinder consist of 12.1 cum, gas filling pressure 230 bar at 27 degree centigrade temperature).gas mixture of 82% argon+18% co2. aas as per en-439-m-21 ]

Central Government/Public Sector

CTN :45197672

28 May, 2026 8.91 Lacs

Raigarh - Chhattisgarh

Tender For corrigendum : supply of 100269286-10-m1060500206- gas,chem,argon,99.999per,gr-1,is5760 , 100269286-20- m1060150090-gas,chem,nitrogen,99.999per,is1747 , 100269286-30-hydraulic testing , 100269286-40- cylinder valve replacement , 100269286-50-spindle replacement , 100269286-60-gland nut replacement , 100269286-70-cylinder painting charges , 100269286- 80-valve safety guard- cylinder cap , 100269286-90- cylinder ring replacement charges , 100269286-100- m1060900204-gas,chem,calibration gas mix,for gc , 100269286-110-m1060900505-gas,chem,calibration gas mix , 100269286-120-m1060950096-gas,chem,zero air,99.999per