Packing Machine Spares Tenders

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CTN :45661134

14 Jul, 2026 NA

Rupnagar - Punjab

Tender For supply and installation of a multi-source (confocal symmetry) rf/dc sputtering system

Co-operative

CTN :45560300

22 Jun, 2026 30.0 Thousand

Rewari - Haryana

Tender For supply of samarpan packing machine spares - supply of samarpan packing machine spares - 3201945, 400.000, hori jaw,rubber strip,samarpan,u108060, 3020839, 35.000, vertical electrode,m584515,samarpan, 3020288, 20.000, hori.teflon cloth,e002675,samarpan 6ltr, 3937350, 5.000

Central Government/Public Sector

CTN :45361550

07 Jul, 2026 NA

Kolkata - West Bengal

Tender For corrigendum : supply of benchtop dc magnetron multi-target sputtering system

CTN :45444446

30 Jun, 2026 NA

Gandhinagar - Gujarat

Tender For supply of automation mechanisms to the shutter and substrate rotation assemblies of magnetron sputtering system

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

Central Government/Public Sector

CTN :45318897

15 Jun, 2026 NA

Varanasi - Uttar Pradesh

Tender For supply of dc & rf sputtering system and accessories

Co-operative

CTN :44938153

05 May, 2026 1.05 Lacs

Rewari - Haryana

Tender For supply of samarpan packing machine spares

Co-operative

CTN :44923690

27 Apr, 2026 95.0 Thousand

Rewari - Haryana

Tender For supply of samarpan packing machine spares - 3201960, 50.000, distan.piece,samarpan,prism10k:m621005/3, 3202002, 50.000, bottom cover,samarpan,prism10k:m404217, 3078765, 50.000, boltallenhead,ss,nut&washerm8x25mmmm, 3201900, 50.000, pressing shaft,samarpan,prism10k:m400449, 3014301, 300.000, bush,samarpan,prism10k:m400953

Co-operative

CTN :44745791

10 Apr, 2026 77.2 Thousand

Rewari - Haryana

Tender For supply of samarpan packing machine spares - 3201910, 50.000, photo mark sensor,banner,me:r58ecrgb1,2m

CTN :44328025

09 Apr, 2026 NA

Delhi - Delhi

Tender For corrigendum : supply, installation and integration of dual-ion beam sputtering coating system with in-situ optical thickness monitoring and other accessories

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