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Central Government/Public Sector

CTN :45263257 Due date: 23 Jun, 202623 Jun, 2026 NA
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

State Government

CTN :44918896 Due date: 05 Jun, 202605 Jun, 2026 21.37 Crore
Tender For corrigendum : maintenance & onsite supervision, monitoring & co-ordination of ahp, round the clock patrolling & maintenance of ash disposal pipelines (lean slurry & hcsd), ash water recovery system (awrs), operation of awrs system and plc operation of ash handling system of 2x500 mw, abvtps, marwa

State Government

CTN :45324103 Due date: 16 Jun, 202616 Jun, 2026 NA
Tender For supply of portable and critical instruments for operational monitoring at wtp-ii, cstps - port dissolved gas analyzer with access., lab inst table top purity meter hydrogen, o2 analyser, lab equip water ultra pure water system

Central Government And Public Sector

CTN :45318661 Due date: 15 Jun, 202615 Jun, 2026 NA
Tender For providing of customized annual maintenance contract/cmc for pre-owned products - annual maintenance contract for pla make radiation monitoring instruments; pla; annual maintenance contract (amc); quarterly; yes

State Government

CTN :45310933 Due date: 01 Jun, 202601 Jun, 2026 16.74 Lacs
Tender For improvements to the irrigation system for effective water regulation including monitoring and management to pothireddypadu new head regulator

CTN :45189430 Due date: 01 Jun, 202601 Jun, 2026 NA
Tender For corrigendum : notice for the supply and installation of online monitoring system for etp water

CTN :45239300 Due date: 25 May, 202625 May, 2026 55.58 Lacs
Tender For annual routine and maintenance operation of various equipments like ei installations, vrv/vrf, access control system, flap barriers, r/o water cooler, air quality monitoring system of defence office complex, africa avenue (a, b block) and kg marg, new delhi dg. 2025-26. (sh: annual comprehensive maintenance of access control system including flap barriers installed at doc, africa avenue and kg marg)subwork/packages:(sh: annual comprehensive maintenance of access control system including flap barriers installed at doc, africa avenue and kg marg)

State Government

CTN :45267926 Due date: 03 Jun, 202603 Jun, 2026 8.90 Lacs
Tender For improvements strengthening of irrigation system for effective water regulation including monitoring and management for tadipudi lift irrigation scheme main canal distributaries and breached portions of canal banks from km 0 000 to km 6 400

State Government

CTN :45267927 Due date: 03 Jun, 202603 Jun, 2026 14.11 Lacs
Tender For improvements strengthening of irrigation system for effective water regulation including monitoring and management for tadipudi lift irrigation scheme main canal distributaries and breached portions of canal banks from km 6 400 to km 26 800

corporations/Associations/Others

CTN :45151981 Due date: 26 May, 202626 May, 2026 39.76 Lacs
Tender For m and r to talegaon chakan centralized wss replacement of electromagnetic flowmeter with wireless flow monitoring system on raw water raising main at raw water pumping station talegaon
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