Tender For purchase of renewable energy practical equipments - equipments for renewable energy practices:, rc phase shift oscillator oscillator type: rc phase shift oscillator using transistor / op-amp configuration. input supply: 230 v / 50 hz ac with regulated internal dc supply. output frequency range: 100 hz 10 khz adjustable. output: sinusoidal waveform with adjustable amplitude up to 10 vpp. rc network: three-stage rc phase shift network with frequency control arrangement. cro test points: dedicated cro terminals at amplifier output, each rc stage, and final output for waveform and phase-shift observation. protection: over-voltage and short-circuit protection provided. indicators and controls: power on led indication with frequency and gain adjustment controls. accessories: patch cords, circuit diagram, strain guage characteristics kitac mains power supply: 230 v 10%, 50 hz metal foil strain gauge mounted on beam/cantilever. strain measurement under applied load. wheatstone bridge arrangement. signal conditioning and amplification circuit. instrumentation amplifiers with 3 digit display for strain / output voltage. zero and gain adjustment controls. provision for applying calibrated loads. table-top trainer with labelled panel. test points for signal measurement. built-in dc power supplies and wooden closed cabinet. supplied with patch cords, load cell characteristics kit input supply: 230 v / 50 hz ac with regulated internal dc supply. sensor: strain gauge load cell with suitable mounting arrangement. load range: 0 10 kg. display: digital display for load/output indication. cro / test points: test points provided for observing bridge output, amplifier output, and signal conditioning stages. controls: zero adjustment and calibration controls provided. protection: overload and short-circuit protection provided. accessories: loading arrangement, connecting leads., measurement of tank level using rotometer input supply: 230 v / 50 hz ac with regulated internal dc supply. tank arrangement: transparent tank with 30 liters capacity with suitable supporting stand. rotameter range: 0 4000 l/hr calibrated rotameter. flow system: pump, control valves, and piping arrangement provided for continuous flow operation. measurement facility: provision for flow-based tank level measurement and observation. display / observation: calibrated level indication with flow monitoring arrangement. test points: output terminals provided for monitoring sensor/output signals. accessories: connecting tubes., measurement of tank level using displacer type level transmitter input supply: 230 v / 50 hz ac with regulated internal dc supply unit. measurement principle: buoyancy (archimedes principle) using displacer element. tank arrangement: transparent experimental tank with 30 liters capacity and suitable mounting stand. level range: suitable laboratory-scale level measurement (0 100% tank height). sensor system: displacer type level transmitter with continuous level output signal. display unit: digital indicator for level display in percentage / engineering units. output signals: standard analog output (4 20) ma / (0 10) v provided for monitoring. test points: provided for transmitter output, signal conditioning, and display unit verification. controls: zero and span calibration adjustment provided for setting level reference. protection: over-voltage and short-circuit protection for electronic modules. accessories: connecting cables, piping arrangement, loading medium (water), measurement of temperature using pt100 input supply: 230 v / 50 hz ac with regulated internal dc power supply unit. sensor: pt100 resistance temperature detector (rtd) probe with stainless steel sheath. measurement principle: resistance variation of platinum element with temperature. temperature range: 0 c to 150 c (or suitable laboratory range). display unit: digital temperature indicator with direct c display. accuracy: high accuracy with linearized rtd signal conditioning circuit. sign
Tender For purchase of lab equipments for res dept - purchase of lab equipments for res dept, rc phase shift oscillator (iemcode:o001)specifications: oscillator type: rc phase shift oscillator using transistor / op-amp configuration. input supply: 230 v / 50 hz ac with regulated internal dc supply. output frequency range: 100 hz 10 khz adjustable. output: sinusoidal waveform with adjustable amplitude up to 10 vpp. rc network: three-stage rc phase shift network with frequency control arrangement. cro test points: dedicated cro terminals at amplifier output, each rc stage, and final output for waveform and phase-shift observation. protection: over-voltage and short-circuit protection provided. indicators and controls: power on led indication with frequency and gain adjustment controls. accessories: patch cords, circuit diagram., strain guage characteristi cs kit(iemcode:o002)specifications: ac mains power supply: 230 v 10%, 50 hz metal foil strain gauge mounted on beam/cantilever. strain measurement under applied load. wheatstone bridge arrangement. signal conditioning and amplification circuit. instrumentation amplifiers with 3 digit display for strain / output voltage. zero and gain adjustment controls. provision for applying calibrated loads. no rs.10,000 2 table-top trainer with labelled panel. test points for signal measurement. built-in dc power supplies and wooden closed cabinet. supplied with patch cords, load cell characteristi cs kit(item code: o003)specifications:input supply: 230 v / 50 hz ac with regulated internal dc supply. sensor: strain gauge load cell with suitable mounting arrangement. load range: 0 10 kg. display: digital display for load/output indication. cro / test points: test points provided for observing bridge output, amplifier output, and signal conditioning stages. controls: zero adjustment and calibration controls provided. protection: overload and short-circuit protection provided. accessories: loading arrangement, connecting leads., measurement of tank level using rotometer(item code: o004)specifications: input supply: 230 v / 50 hz ac withregulated internal dc supply. tank arrangement: transparent tank with 30 liters capacity with suitable supporting stand. rotameter range: 0 4000 l/hr calibrated rotameter. flow system: pump, control valves, and piping arrangement provided for continuous flow operation measurement facility: provision for flow-based tank level measurement and observation. display / observation: calibrated level indication with flow monitoring arrangement. test points: output terminals provided for monitoring sensor/output signals. accessories: connecting tubes., measurement of tank level using displacer type level transmitter(item code: o005)specifications: input supply: 230 v / 50 hz acwith regulated internal dcsupply unit. measurement principle:buoyancy(archimedesprinciple) using displacerelement tank arrangement: transparent experimental tank with 30 liters capacity and suitable mounting stand. level range: suitable laboratory-scale level measurement (0 100% tank height). sensor system: displacer type level transmitter with continuous level output signal. display unit: digital indicator for level display in percentage / engineering units. output signals: standard analog output (4 20) ma / (0 10) v provided for monitoring. test points: provided for transmitter output, signal conditioning, and display unit verification. controls: zero and span calibration adjustment provided for setting level reference. protection: over-voltage and short-circuit protection for electronic modules. accessories: connecting cables, piping arrangement, loading medium (water), measurement oftemperature using pt100(item code: o006a)specifications: input supply: 230 v / 50 hz ac with regulated internal dc power supply unit. sensor: pt100 resistance temperature detector (rtd) probe with stainless steel sheath measurement principle: resistance variation of platinum element with temperature. temperature range: 0 c to
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis
Tender For corrigendum : maintenance & onsite supervision, monitoring & co-ordination of ahp, round the clock patrolling & maintenance of ash disposal pipelines (lean slurry & hcsd), ash water recovery system (awrs), operation of awrs system and plc operation of ash handling system of 2x500 mw, abvtps, marwa
Tender For supply of portable and critical instruments for operational monitoring at wtp-ii, cstps - port dissolved gas analyzer with access., lab inst table top purity meter hydrogen, o2 analyser, lab equip water ultra pure water system
Tender For improvements to the irrigation system for effective water regulation including monitoring and management to pothireddypadu new head regulator
Tender For annual routine and maintenance operation of various equipments like ei installations, vrv/vrf, access control system, flap barriers, r/o water cooler, air quality monitoring system of defence office complex, africa avenue (a, b block) and kg marg, new delhi dg. 2025-26. (sh: annual comprehensive maintenance of access control system including flap barriers installed at doc, africa avenue and kg marg)subwork/packages:(sh: annual comprehensive maintenance of access control system including flap barriers installed at doc, africa avenue and kg marg)
Tender For improvements strengthening of irrigation system for effective water regulation including monitoring and management for tadipudi lift irrigation scheme main canal distributaries and breached portions of canal banks from km 0 000 to km 6 400
Tender For improvements strengthening of irrigation system for effective water regulation including monitoring and management for tadipudi lift irrigation scheme main canal distributaries and breached portions of canal banks from km 6 400 to km 26 800