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Bid Submission Date Range
Tender Value

CTN :44675025 Due date: 22 Jun, 202622 Jun, 2026 NA
Tender For bid to ras supply of fully automatic saree rolling machine

Central Government/Public Sector

CTN :45598065 Due date: 10 Jul, 202610 Jul, 2026 1.99 Lacs
Tender For purchase of spares for praga make thread rolling machine. - worm gear wheel-513 5q 05, worm gear, shaft-513 5j 01, roller cleaning, brush-12001638, filter- 2500000995, work rest m20x2.5px180l, uj cross piece assy.with, bearing, t bolt-513 2a 15, vertical locking tenon- 513 2a 07, wedge-513 2a 08

CTN :44538658 Due date: 19 Jun, 202619 Jun, 2026 NA
Tender For bid to ras supply of rolling machine for circular and shaped cord as per spec no. hemrl/css/rm/2025/4

corporations/Associations/Others

CTN :45532876 Due date: 27 Jun, 202627 Jun, 2026 NA
Tender For renovation and replacement of damaged and worn out spare parts with new ones for sludge pump-1 with ancillary works at wtp-iv, garden reach water works.- manufacturing, supply & delivery of pump - shaft made off ss-316 for 647 cum/hr., 15 mtrs head sludge , pump with necessary keys etc, as per sample at garden reach water treatment plant., , manufacturing, supply & delivery of shaft -sleeve, , made of ss-316 for 647 cum/hr., 15 mtrs head sludge, , pump as per sample at garden reach water, , manufacturing, supply &delivery of casing ring made of nici for 647 cum/hr., 15 mtrs head sludge pump as per sample at garden reach water treatment plant., , manufacturing, supply &delivery of split gland made of nici for 647 cum/hr., 15 mtrs head sludge pump as per sample at garden reach water treatment plant, , manufactering, supply delivery of baaring housing made of nici for 647 cum/hr., 15 mtrs head sludge pump as per sample at garden reach water treatment plant., , manufactering, supply delivery of lock nut of impeller made of ss for 647 cum/hr., 15 mtrs head sludge pump as per sample at garden reach water treatment plant., , manufactering, supply & delivery of lock nut of bearing made of ss for 647 cum/hr., 15 mtrs head sludge pump as per sample at garden reach water treatment plant., , balancing of rotating assembly of 647 cum/hr., 15 mtrs head sludge pump including loading, unloading and transportation from and to at garden reach water treatment plant, , total rotating assembly & keep it at a suotable place after opening the top cover of pump unit. dismantling the bearing housing at both end & as per direction of eic., , manufacturing, supply & delivery of impeller made of nici for 647 m?/hr., 15 mtrs head sludge pump as per sample at garden reach water treatment plant, , manufacturing.. supply delivery of bearing housing cover (d.e side) made of nici for 647 m?/hr., 15 mtrs head sludge pump as per sample at garden reach water treatment plant, , manufacturing, supply &delivery of bearing housing cover (n.d.e side) made of nici for 647 m?/hr., 15 mtrs head sludge pump as per sample at tp-1, grww. garden reach water treatment plant, , manufacturing, supply &delivery of supporting foot made of nici for 647 m?/hr., 15 mt head sludge pump as per sample at garden reach water treatment plant., , m.s plate as per is: 2062-2011/latest revision, make: sailitataijindal (b) above 2 mm upto 10 mm thickness, , fabricating m.s. specials of different diameter in shop out of 8 mm to 12 mm thick m.s plates supplied depart-mentally, cutting the plates to exact size & shape by gas cutting device and/or by adopting any other approved type of mechanical means, bending the same in true curvature by template and rolling machine of approved design including proper marking, levelling joints followed by electric arc welding - longitudinal and circumferential, as necessary, using standard electrodes as per i.s.specification including edge preparation, electricity charges and hydraulic testing of the fabricatedpiece all complete as per specification and direction of the engineer-in-charge. [the engineer-in-charge shall approve the electrodes for are welding before use. fabrication of m.s. flange to form m.s flanged tail piece shall not be considered as m.s. special], , cutting to requisite length or shape departmental r.s. joists, channels, angles, tees, plates etc. (payment to be made on area of cut surface), , welding in m.s. structural work with gas or electric: (a) tack weld, , welding in m.s. structural work with gas or electric: (b) continuous weld., , supply of m.s. flange (slipper type) as per is-6392 table 17 thickness 12mm nb diameter in mm 350, , flange joint to c.i./d.i/ms. pipes and specials including supply of rubber gasket, nuts, bolts, washers etc. of best quality to make the joint watertight at required hydraulic pressure all complete as per specification & direction of the engineer-in-charge. di

Central Government/Public Sector

CTN :45361550 Due date: 07 Jul, 202607 Jul, 2026 NA
Tender For corrigendum : supply of benchtop dc magnetron multi-target sputtering system

CTN :45444446 Due date: 30 Jun, 202630 Jun, 2026 NA
Tender For supply of automation mechanisms to the shutter and substrate rotation assemblies of magnetron sputtering system

Central Government/Public Sector

CTN :45263257 Due date: 23 Jun, 202623 Jun, 2026 NA
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

Central Government/Public Sector

CTN :45010120 Due date: 27 May, 202627 May, 2026 NA
Tender For corrigendum : supply of cold rolling machine (model: bc-2c)

CTN :45110726 Due date: 30 May, 202630 May, 2026 NA
Tender For auction sale of assets - hausler rolling machine qty-01 located at alcock yard old workshop.

Central Government/Public Sector

CTN :45054908 Due date: 12 May, 202612 May, 2026 NA
Tender For auction sale of depot miscellaneousellaneous scrap - cond and scrap all type of dismental machinery part comp. hydraulic elevating table portable air installation current transformer , hand rolling machine, air compressor, chord trolly, electric blower with motor, pump with motor, rectifier battery charging wasting house, pistal grip, portable electric drill, automatic fan winding machine, hand pallet, tanki, accl compressor, vacuum reservoir and other miscellaneous machinery part, different make and capacity - with motor, along with accessories with n/f attachment, broken , as is where is basis as it is. loading by purchaser
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