Thermal Resistor Tenders

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CTN :45607910

23 Jul, 2026 NA

Multi City - Multi State

Tender For magnetron sputtering physical vapor deposition unit

Central Government/Public Sector

CTN :45566473

07 Jul, 2026 NA

Ahmedabad - Gujarat

Tender For constant power mode dc power supply for magnetron sputtering plasma source

CTN :44740544

17 Jun, 2026 NA

Mumbai - Maharashtra

Tender For bid to ras supply of high power impulse magnetron sputtering (hipims) hv pulser with hipims dc drive

Central Government/Public Sector

CTN :45361550

07 Jul, 2026 NA

Kolkata - West Bengal

Tender For corrigendum : supply of benchtop dc magnetron multi-target sputtering system

State Government

CTN :45467727

30 Jun, 2026 NA

Delhi - Delhi

Tender For supply of three target dc & rf magnetron sputtering machine

CTN :45444446

30 Jun, 2026 NA

Gandhinagar - Gujarat

Tender For supply of automation mechanisms to the shutter and substrate rotation assemblies of magnetron sputtering system

CTN :45177084

12 Jun, 2026 NA

Visakhapatnam - Andhra Pradesh

Tender For corrigendum : tender for supply of rs 422 splitter , filter rohs electrical mains 6 , cat 1 radar dongle , trigger pcb , motor drive pcb(bme radar c181/4e) , slave junction box with insulation kit , slave junction box , power supply for dcu , video control unit , turning unit-25kw x band af pm , lcd display-25.5 , 340 mm dual radar input display deck standing , 4 pair data cable , pcb trigger assembly , pcb assembly , ac psu , p.c.b. assembly - input (aloft s-band) , receiver assembly , modulator pcb assembly - 30kw , p.c.b. assembly - 6 way interswitch , switch assembly kit , control panel assembly (basic) , pcb assembly - psu , magnetron mg5223 30kw

corporations/Associations/Others

CTN :45378169

09 Jun, 2026 NA

Agra - Uttar Pradesh

Tender For auction sale of machinery o/s (grass cutting),machinery o/s (grassing cutting),machinery o/s (typewriter),magnetron o/s,motor o/s (washing),mt componenet (track link, pressure plate, mix),mt component,mt component (track link),mt component (mix),mt component (jack),mt scrap,optical instrument,plastic scrap (mix),plastic scrap mix,radio scrap,soft platic sp (suitcase)

Central Government/Public Sector

CTN :45347845

17 Jun, 2026 NA

Gandhinagar - Gujarat

Tender For supply of magnetron sputter source

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

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