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Central Government/Public Sector

CTN :45263257 Due date: 23 Jun, 202623 Jun, 2026 NA
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

Central Government/Public Sector

CTN :45326472 Due date: 03 Jun, 202603 Jun, 2026 1.21 Crore
Tender For construction of twin chamber acoustic material testing and uitility building including electrification for atf division, nwtc, belur campus, csir-nal, bengaluru - 560037

State Government

CTN :45343434 Due date: 02 Jun, 202602 Jun, 2026 3.88 Lacs
Tender For construction of 01 no rain water harvesting chamber in bhajanpura thana premises (pwd) in ghonda constituency under ee (c )-06

State Government

CTN :45326740 Due date: 02 Jun, 202602 Jun, 2026 1.61 Lacs
Tender For hew 72 providing and fixing road gully chamber near t/well no. 3 in sec-2, palwal and all other works contingent thereto.

Central Government/Public Sector

CTN :45346382 Due date: 09 Jun, 202609 Jun, 2026 4.74 Lacs
Tender For cleaning of sewer lines cleaning of drainage rainwater chamber cleaning of gully trap at isi campus delhi centre new delhi 110016

Central Government And Public Sector

CTN :45312803 Due date: 02 Jun, 202602 Jun, 2026 10
Tender For invitation of quotation for supply of consumables items to brims teaching hospital bidar. - transducer protector - dia, dosing chemical (ion - exchange), r.o. jumbo filter (5 microns), inj erythropoietin 4000 iu, concentrated acidic solution, sodium bicarbonate 600gm i.p. sodium chloride 235 i.p. salt for bicarbonate haemodialysis, avf needle 16g with fixed needle non rotating, inj heparin 25000iu, blood tubing set for haemodialysis with post pump arterial chamber, dialyser (f5) polysulfone membrane

State Government

CTN :45324858 Due date: 03 Jun, 202603 Jun, 2026 76.7 Thousand
Tender For operation and maintenance - water supply schemes-wss to aruvippuram scheme- valve installation at konnattupotta-construction of valve chamber and valve installation at konnatthupotta, punnakkad

Central Government/Public Sector

CTN :45346630 Due date: 17 Jun, 202617 Jun, 2026 17.01 Lacs
Tender For supply of counting chamber neubauer , funnel , kidney tray , pasteur pipette , nesslers cylinder , test tube , staining rack , test tube stand 18x150 mm , test tube stand 12x100 mm , aluminium test tube stand 12x100 mm , test tube holder , test tube brush , beaker , spatula , hb pipette , hb tube , phosphate buffer , eosinophil diluting fluid , hydrogen peroxide , leishman stain , rbc diluting fluid , wbc diluting fluid , platelet diluting fluid , spirit lamp , staining rod , haemometer shalis method , absolute methanol , glass stirrer rods , rbc pipette , wbc pipette , h560 diluents , h560 lyse 1 , h 560 lyse 2 , vacutainer needle holder for eclipse vacutainer needle , eclipse vacutainer needle , urine strip 2 parameters , k2 edta , urine container sterile , cube 30 touch quality control , 5percentage hypochlorite solution , soap solution , what man filter papers , microscopic slide , cedar wood oil , elite h clean , urine test strip 10 parameters , microscopic coverslip , bloodgrouping kit combined abd , bloodgrouping kit a1 lectin db , malariap falciparum pldh plasmodium speciespan test card , absolute methanol 1 x 500 ml , micro tips 200 microlitre , lancet biosensor disposable sterile safety lancet , spreader slide for smear study nonsterile , lens cleaner for microscope , urine strip control , tourniquet , urine strip , semen diluting fluid with expired date , micropipette stand , glass micro capillary tube ) /bid number : gem/2026/b/7588659 * /dated: 27-05-2026 & & / bid document 1 / 55

State Government

CTN :45340481 Due date: 04 Jun, 202604 Jun, 2026 31.41 Lacs
Tender For construction of ugt 100 kl, pump chamber, boundary wall and laying of connecting pipe line in village buraka hathin

State Government

CTN :45325036 Due date: 01 Jun, 202601 Jun, 2026 4.12 Lacs
Tender For fatehabad town a/mtc estimate for construction of pump chamber at patwar bhawan b/stn fatehabad town
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