Latest water manifold Tenders | Government water manifold Tenders

Central Government/Public Sector

CTN :45640304

25 Jun, 2026 NA

Prayagraj - Uttar Pradesh

Tender For supply of water manifold with brass cock and pipe make-eeci [ warranty period: 3 months after the date of delivery ] ]

CTN :45619242

29 Jun, 2026 NA

Delhi - Delhi

Tender For supply of fuel filter,hose clip,hose clip,o ring,o ring,pre fuel filter element,set of hoses,set of o ring 4g11t ta,gasket cyl head,hex bolt intake manifold,m8x1.25 x60 hex screw for rock,nut for rocker adjusting screw,plain washer,hose clip,sealing ring,copper washer,lub oil filter,cogged belt,valve stem seal,push rod,m14x150 bolt cyl head,valve collet,water pump assy,gasket air intake manifold,gasket for oil header assy,gasket water manifold,gasket ex manifold,gasket for water inlet pipe,gasket tc oil supply,gasket tc oil drain,gasket for turbo out and exhaust,gasket rocker arm,air filter element

CTN :44991773

19 Jun, 2026 NA

Indore - Madhya Pradesh

Tender For bid to ras supply of multiple fiber laser pump combiner with signal feed through

Central Government/Public Sector

CTN :45539329

19 Jun, 2026 NA

Ernakulam - Kerala

Tender For supply of spares for cummins qsk 19 g6 (sno. 25405778) engine to lakshadweep electricity department (offline tender) - 4009220/4371769 liner cylinder, 4009625 liner o ring, 4313887 cylinder head (rc, 4352366/4918058 piston assy, 4090028 piston ring, 3028291 o ring water manifold, 206277 gasket air manifold, 3043097 gsaket exhaust manifold, 3081898 gasket valve cover, 3079754 gasket oil strainer pipe, 3931904 cummins gasket maker

Central Government/Public Sector

CTN :45527790

18 Jun, 2026 NA

Paschim Medinipur - West Bengal

Tender For corrigendum : providing of repair and overhauling service - diesel generators- dg sets; e-225 sea water leakage observed in pda overboard exhaust cooling water manifold; no; buyer premises

Central Government/Public Sector

CTN :45529987

03 Jul, 2026 NA

Katipala - Karnataka

Tender For 1300076712 cooling water manifold 7p im machine, m. c# 235737 / 470 s 1000 - 170, hsn/sac code-9026108 , 1300076713 accumulator pack, cpl, im machine, 446881 (old p. no-191051) , hsn/sac code-85075000

CTN :44993315

10 Jun, 2026 NA

Delhi - Delhi

Tender For bid to ras supply of long block 4g11ta engine , liquid gasket , lub oil filter element , pre fuel filter element , set of hoses , sealing ring , thermostat element , gasket air intake manifold , gasket water manifold , gasket ex manifold , gasket tc oil supply , gasket tc oil drain , gasket for turbo out and exhaust

CTN :45433979

15 Jun, 2026 NA

Delhi - Delhi

Tender For supply of screw captive washer cap , gasket turbocharger mfld , gasket exhaust manifold , seal o ring , gasket head to shell , screw adjustable injector , fan belt , gasket thermostate , gasket inlet manifold , gasket rocker liver housing , gasket intake manifold , valve exhaust , push rod , push rod injector , screw hexagon head cap , belt water pump , washer plain , tube water inlet , tube air inlet , gasket collection , liquid gasket , gasket cylinder head , hose plain , hose , o ring water manifold , hose vent , lo filter std , element fuel filter , washer , washer lock 5a6

CTN :45358867

09 Jun, 2026 NA

Jodhpur - Rajasthan

Tender For providing of repair and overhauling service - mt spares 09 lines; switch combination, brake fluid container, low pressure switch, air distributor and, dryer unit, water manifold pipe, auxiliary water tank, radiator hose set, bush kit, pipe flexible 1/2"

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

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Central Government/Public Sector

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Central Government/Public Sector

Central Government/Public Sector

Central Government/Public Sector