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CTN :45688518 Due date: 17 Jul, 202617 Jul, 2026 NA
Tender For supply of analysed oil samples and disposal record , boiler water analysis record , calibration record, carbon analyzer , calibration record, flame aas , calibration record, analytical balance , calibration record, mass spectrometer , calibration record, weight box, e1 , calibration record, gc, mp , calibration record, ion chromatograph , calibration record, kf titrator , calibration record, ftir , calibration record, conductivity meter , cooling water analysis record, landscape , calibration record, density meter, dma 58 , density meter calibration record , dissolved oxygen record , dm plant cpp analysis record , dm plant analysis record , calibration record, flame photo meter , calibration record, h2s gas bombs, ss sample containers , lab effluents discharge , monthly report for trade effluents , na2so4, recovery analysis record , ng heavy water analysis record , non returnable material dispatch record , oxygen 18 sample analysis record , observation book for kmno4 demand , pc and al analyzed samples disposal record , calibration record, ph meter , process liquids analysis record , raw material analysis record, h2so4 , raw material analysis record, naoh , raw material analysis record, na2s and nahs , raw material analysis record, hci , raw material analysis record, alum , raw material analysis record, libr , raw water treatment plant analysis record , rcu gas analysis record , seal and lube oils analysis record , system and purge gas analysis record , calibration record, turbidity meter , uv visible observation book , waste stripper average record , xu samples analysis record , bottom ash analysis record , boiler feed, dissolved oxygen, iron and copper record , flue gas analysis record , scc ltd. coal analysis record , spm analysis record , single ruled book

CTN :45351994 Due date: 19 Jun, 202619 Jun, 2026 NA
Tender For corrigendum : supply of anaesthesia workstation (v2) (q2) , multipara monitor - low end (q2) , portable ultrasound machine (v2) (q2) , c-arm , centrifuge machine , neuromuscular monitor , flexible laryngoscope with channel , infusion pump , emergency cpap kit for ambulance , icu ventilator , defibrilator , 3d echocardiography machine with colour doppler system , high end advanced icu ventilator , syring infusion pump , fogger , video dermatoscope , bod incubator biological oxygen demand , automated motorized dermabrasion machine , high definitation hd surgical ent microscope , coblator ii generator , mastoid drill , cautery machine , c- arm compatible ot table with fracture attachment , eletric operated drill and reamer , battery operated drill and reamer , electronic pneumatic touniquet , cautery diathermy , fracture fixation set basic instrumentation set for fracture , general orthopeadic instrument set , large fragment instrument set , small fragment instrument set , operation room equipment set , external fixator , c-arm image intensifier , plaster cutting saw , morturay cooler with arrangement to keep 1 body , microtome stedge large cutting , meat cutting machine for thin body sections , weighing machine dial type , equipments for reporting height , weighting machine for organ , steel tape roll measuring upto 3m , stiker autopsy saw with accessories , dissection set , microscope student type , binocular microscope research , x-ray view box one in four , anthropometric set , automatic tissue processing machine , microtome with knife semiautomatic , l mode , paraffin bath embedding , slide warming table , distillation plant , hand set heat sealer , instrument cabinet, instrument trolley , binocular microscope for faculty , binocular microscope for student , biosaftey cabinet class-ii type a2 , double wall distillation set , minus 20 degree celcius deep freezer , bod incubator , lab refrigerator 400ltr. , pcr plate centrifuge , mini centrifuge , laminar air flow system , lab centrifuge , hot air oven , vertical autoclave , minus 80 degree celcius deep freezer , vortex mixture , multichannel pipette , thermo, mixture with dry bath , colony counter , anaerobic apparatus , ditital thermometer , micrometer stage , automatic loop sterlizer , serum inspissators , micrometer eye pieces , co2 incubator , pcr work station , slide warming plate , automated tissue processor , deca head microscope , binocular microscope student , slide cabinet 5000 slides , distillation water still table pattern , digital incubator , hot air oven , digital water bath , digital ph meter , refrigerator , tissue floatation bath , histo grossing table , video bronchoscope , fiber optic bronchoscope , rigid video bronchoscope , pediatric bronchoscope , blood bank refrigerator , reagent cabinet , blood collection monitor , portable tube sealer hand tube sealing apparatus , table top tube sealer , micropipette 10-100 micro litre , micropipette 20-200micro litre , micropipette 100-1000micro litre , 8 channel micropipette , bench top centrifuge - 24 tubes , central nursing station , colour doppler with 2d echo , ecg machine , haemodialysis machine , cardiac output monitor minimally invasive , physiograph , digital ph meter , electro convulsiometer , flame photo meter , rota rod , emg machine , evoked potenial emg and ncv machine , hrv heart rate variability recording machine , tcd transcraninal doppler , automated chemiluminiseence immunoasay , automated biochemistry analyzer open system , fully automated hplc for hba1c , electrolyte analyzer //bid details 2 / 99 for hba1c , electrolyte analyzer

Central Government/Public Sector

CTN :45263257 Due date: 23 Jun, 202623 Jun, 2026 NA
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis
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