Latest gas purification Tenders | Government gas purification Tenders

State Government

CTN :45663538

01 Jul, 2026 9.44 Lacs

Puruliya - West Bengal

Tender For supply and installation of different items for bio gas plant at raghabpur gp purulia-ii block- sludge dewatering press, self-priming slurry pump, biogas burner, gas purification system, gas pipeline, slurry tank

Corporations/Associations/Others

CTN :45621777

24 Jun, 2026 NA

Washim - Maharashtra

Tender For supply of necessary materials and related works to biogas project within the limits of nagar parishad karanja district washim - material, reinforced plastic fibre gas holder 1.3 mtr thickness 5mm clamps, ms dome fitting, gas collection flexible pipe, valve, gaskets...etc. complete., h2s + co2 scrubber; diffuser gas purification etc. complete ms + epoxy; dia. 736mm; height 1250 mm both side dish end nozzle according to drawing, pressure meter + temperature sensor + flow meter etc. complete, slury feed pump capacity (capacity range between 0-30cum/hr) etc complete., side entry agitator power 3 hp moter with gear box etc. complete shaft moc ss304; shaft length 3980mm; impeller ss304; coupling ms, bio-waste shreder with hopper ( 2 working 1 standby) etc. complete motor-10 hp make- crompton or bbl or abb (3phase); moc of structure: ms; motor speed: 1500, waste grider for pulp/slurry making capacity kg /hr (1 working 1 standby) moter 10hp +, digester heating systerm, heat exchanger tube with hot water generation and recirculation system... etc. completediameter 5700 mm; 50 nb pipe; ss 316 coil thicknessof pipe 6mm., reinforced plastic biogas storage bags etc. complete cylindrical shape-200m3 capacity., genset bio gas 50 kva / 40 kwe; biogas generator set with canopy accoustic enclosure etc. complete, screw press technology based solid liquid seperator capacity 5000lit/hr etc complete., slurry mixer for primary digester/feed tank with 3hp motor with ss-impelar and shaft etc complete.

CTN :45333373

26 Jun, 2026 3.33 Crore

Muzaffarnagar - Uttar Pradesh

Tender For corrigendum : supply of interactive panels with cpu (q2) , professional large format display (v2) (q2) , weighing machine , mill house , fully automatic jaggery production unit , solar panel foundation and all related items , structure of complete plant , bought out for complete plan , erection of mill house and boiling house , hdg set , submersible , fire fighting equipment , hcl kit single , oilfree 15 com , air filter , cylinder c2h2 , regulator c2h2 , hood aas , vacuum hot air oven , digital hot air oven , air circulation fan , microprocessor digital temperature indicator , digital timer , heating mantle , digital muffle furnace , single beam uv , double beam uv , digital photo colorimeter , weighing balance , analytical balance cy , water bath , pid temperature controller , atomic absorption spectrophotometer , gas chromatography , fused silica capillary column , gas purification panel , electromechanical voltage stabilizer , carbon steel cylinder , pressure regulator , glassware , servo candy pillopack wrapping machine , horizontal flow wrapepillopack high speed packaging machine , automatic packing machine , vertical single face paper corrugating machine , corrugated sheet pasting machine , eccentric slotter machine , bar rotary cutting creasing machine , stitching machine , paper reel to sheet cutting machine , flexo graphic printing machine , printing machine , manual jar filling machine , manual pouch sealing machine , manual sticker labelling machine , bag sewing machine , bar coding equipment , bar reader machine , projector , laptop , public address audio system , pantry , desktop with accessorie , tv 45 inch screen , solar panel , bio fertilizer plant , cctv unit for control ) /bid number : gem/2026/b/7564787 * /dated: 26-05-2026 & & / bid document 1 / 42

Central Government/Public Sector

CTN :45361550

07 Jul, 2026 NA

Kolkata - West Bengal

Tender For corrigendum : supply of benchtop dc magnetron multi-target sputtering system

CTN :45444446

30 Jun, 2026 NA

Gandhinagar - Gujarat

Tender For supply of automation mechanisms to the shutter and substrate rotation assemblies of magnetron sputtering system

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis