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Tender For water treatment plant cleaning,purchasing of equipments for wtp, laying of di pipes and sluice valves, construction of sv chamber and phed esr repairing for jamtara nagar panchayat. - labour for site clearance -do--e/i, desilting the supply well, intake well /head works, sump of water supply /sewerage works etc. in wet or dry condition including lifts upto 9 m and lead upto 150m as required beyond the work site,stacking, spreading, including necessary guarding, etc. complete, as directed by e/i, supplying and laying of rapid sand gravity filter sand, supplying and laying of rapid sand gravity filter gravel, supplying of bamboo for scaffolding works, supplying of narial ropes for binding works submersible pump set, requirement of plumber class-ii for opening & closing of valve & other related works, requirement of electrician grade-ii for making required connections & other related works, hiring of different tools,chain pulley & tackles for cleaning & other works, disposal of excavated earth & filter bed sand, sand (lead 02k+10p=12 km), gravel (22 k.m. lead), tyre coupling (unique 3409-gn tyre coupling for 100hp & 50hp), bosch lithium based grease, graphit gland pack rope 12mm, graphit gland pack rope 16mm, 2.2kw (3hp) foot mounted motor tefc 1500 rpm 3-phase motor for clariflocculator, multi-blade paddles mounted on central shaft driven by foot-mounted geared motor, onload changeover switch 800a,415v, 4 pole, digital voltmeter (0-500v)-3 phase indicator, digital ammeter (0-500a)-3 phase indicator, led indicator lamp or phase light (r/y/b/g), pvc/xlpe insulated pvc sheated heavy duty,armoured lt cable with aluminium conductor voltage upto and including 1100 v, 240sqmm, 3.5 core, 2.5 sqmm isi marked frls pvc insulated, single core copper conductor cable, 1.5 sqmm isi marked frls pvc insulated, single core copper conductor cable, laying of one number pvc insulated and sheated/xlpe power cable of 1.1kv grade of size not exceeding 35sqmm direct in ground including excavation, sand cushioning and refilling the trench, tapered bearing 7316 mcb (large), deep groove ball bearing 6311 mcb (small), chain pulley block hoist 5 tonne, 360 rotation, 3mtr lifting height, pipe wrench, 18 inch taparia adjustable heavy duty pipe wrench, pipe wrench, 14 inch taparia adjustable heavy duty pipe wrench, 1/2" sqaure drive flank drive taparia goti 22mm socket set, 1/2" sqaure drive flank drive taparia goti 20mm socket set, rachet wrench, 18 inch single sided rachet wrench, 1/2 inch drill bit for threading di/ci pipe, tata agrico hammer -dfs- 2.5kg, 6 inch tyton epdm/sbr rubber gasket for 150mm di pipe conforming to is:5382 isi mark, 4 inch tyton epdm/sbr rubber gasket for 100mm di pipe conforming to is:5382 isi mark, 6 inch di end cap flanged type for 150mm di pipe, 4 inch di end cap flanged type for 100mm di pipe, epdm rubber gasket for non-return valve, earthwork in excavation in foundation (as per i.s. 3114/1965 for laying of different types & sizes of pipes) so as to give one meter average cover over the the socket of pipe with disposal of excavated earth within initial lead lift as per specification & direction of e/i (k-7 150mm), earthwork in excavation in foundation (as per i.s. 3114/1965 for laying of different types & sizes of pipes) so as to give one meter average cover over the the socket of pipe with disposal of excavated earth within initial lead lift as per specification & direction of e/i (k-7 100mm), earthwork in excavation in foundation (as per i.s. 3114/1965 for laying of different types & sizes of pipes) so as to give one meter average cover over the the socket of pipe with disposal of excavated earth within initial lead lift as per specification & direction of e/i (k-7 100mm repair), earth filling in foundaion trenches and plinth in layers not exceding 150 mm thick well watered, rammed, fully compacted and fine dressed with earth obtained from excavation of foundation trenches wit
Tender For repair and rewinding of 01 nos. 150 bhp sewerage submersible pump at gurunanakpura disposal,02 nos12.5 bhp sewer submersible pump at kabir colony dispsoal and 01 nos. 50 bhp sewer submersible pump at peer bodhi disposal and replacemant of parts of 02
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ionpump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis
Tender For bid to ras supply of sputter ionpump power supply control pcb b b -sputter ionpump power supply control pcb , sputter ionpump power supply control pcb. , sputter ionpump , sputter ionpump 4 to 20ma output pcb
Tender For rewinding/repair of motor pump set - a/mtc sewerage scheme hansi town ` rewinding/repair of motor pump set at disposal mps hansi and all other works contingent thereto