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Tender Value

CTN :45738439 Due date: 30 Jul, 202630 Jul, 2026 NA
Tender For ion pump controller with cable for klystron tube

State Government

CTN :45676057 Due date: 02 Jul, 202602 Jul, 2026 26.18 Lacs
Tender For annual maintenance and house keeping, tank & fountain cleaning, providing plumber and carpenter, repair to pump and pumping machineries and other allied works for the period 01.08.2026 to 31.07.2027 at chief secretary residence & home office, palace road, bengaluru.

State Government

CTN :45646277 Due date: 29 Jun, 202629 Jun, 2026 20.57 Lacs
Tender For repair maintenance of pump set fountain, scada at college building, various hostel and type vi, type v, type i, residential quarters at mamc at new delhi sh providing electrically operated gate

CTN :45657452 Due date: 24 Jul, 202624 Jul, 2026 NA
Tender For sputter ion pump (sip) ~ 70 i/s with compatible sip end high voltage cable connector

Central Government/Public Sector

CTN :45664419 Due date: 13 Jul, 202613 Jul, 2026 NA
Tender For repair/ maint of internal electrification and repair/ maint of water supply distribution lines, pump, fountain and cleaning of sump/ tank alongwith its connected works at sangli apartments under ge new delhi

CTN :45593958 Due date: 25 Jun, 202625 Jun, 2026 7.53 Lacs
Tender For repair maintenance of fire fighting fire alarm pa drinking water pump and fountain at rbcc building president estate new delhisubwork/packages:replacement of water treatment plant

CTN :45512112 Due date: 24 Jul, 202624 Jul, 2026 NA
Tender For supply of triode sputter-ion pump with its compatible controller, hardware and essential spares

CTN :45439824 Due date: 11 Jun, 202611 Jun, 2026 46.56 Lacs
Tender For 1) repair maintenance of submersible pump sets in north and south cascade at vijay chowk, new delhi. 2) repair maintenance of fl. fitting and pump set at north & south cascade at vijay chowk, new delhi. (sh: providing services for operation of stone pole & metallic pole, flood light fittings and pumps for fountains, fountain under water rgb lights.)

Central Government/Public Sector

CTN :45263257 Due date: 23 Jun, 202623 Jun, 2026 NA
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

CTN :45226559 Due date: 23 May, 202623 May, 2026 95.19 Lacs
Tender For corrigendum : repair maintenance of fountain pump set at various places at rashtrapati bhavan new delhisubwork/packages:operation and cleaning of all fountains water channels at different locations in rashtrapati bhavan
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