Lcr Q Meter Tenders

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CTN :45544652

26 Jun, 2026 NA

Howrah - West Bengal

Tender For supply of auto digital dual lcd display lcr-q- meter as per enclosed specification, warranty 01 year, make - metravi, htc, miko or similar [ warranty period: 30 months after the date of delivery ] ]

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

CTN :44778491

22 Apr, 2026 NA

Hyderabad-T - Telangana

Tender For supply of electrical lab equipment at jntuh ucem and jntuh ucej - voltmeter (digital) , ammeter (digital) , ammeter (digital) , current source meter , resistor , lcr multi meter , stabilizer , rl., rc and rlc series circuit kit , connecting wires( small size), (dual pin connector) , d.c. servo meter kit , a.c. servo meter kit , temperature- controller (pid) kit , digital cro (dual channel) , ammeter , voltmeter (digital) , ammeter , ammeter , wattmeter (upf) , wattmeter (lpf) , voltmeter (analog) , ammeter (analog) , resistive load , resistive load , inductive load , inductive load , study of v-i , characteristics of scr, mosfet & igbt kit , speed control of dc , motor controlled converter kit , speed control of induction motor kit , single phase series inverter with r & rl load kit , isolation transformer (tapping transformer) , center tapping transformer (30, 0, 30) v , rheostat , digital cro (2-channel, 4-channel)

CTN :44370315

04 Apr, 2026 NA

Aurangabad-Mh - Maharashtra

Tender For corrigendum : supply of uv transilluminator , micro photography camera , rotary evaporator- orbit , anatomical microscope , rotary microtome , rotary evaporator with suction pump and chiller , rotospin rotary mixer , automatic water level recorder , photoreactor , ice cube machine , lcr-q meter

CTN :44689916

07 Apr, 2026 NA

Howrah - West Bengal

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