Latest mass flow controller Tenders | Government mass flow controller Tenders

CTN :45326601

17 Jun, 2026 NA

Madurai - Tamil Nadu

Tender For corrigendum : supply of equipment for logistics department - paper tearing test measuring range 0 to 1000 mn capacity resolution 0.1 mn indication error 1 % tearing arm 104 1 mm tearing angle 27.5 0.5 tearing distance 43 0.5 mm, paper puncture testing machine energy range of weights - 6, 12, 24 joule per meter accuracy - 2% within full range release angle of pendulum - 90 display - led (digital) 7 segment power - 220v, 50hz,single phase highlights: sample holder - 1 pendulum release mechanism -manual material -mild steel finish - powder coated havel gray & gray combination finish and bright chrome/zinc plating for corrosion resistant finish, weighing machine max capacity (max) maximum load the scale can measure. (3 kg ), min capacity (min) minimum load required for accurate measurement. (0.25 kg), 0.1 g 1 g resolution, sling psychrometer, bursting strength tester capacity: commonly 0 40 kg/cm . accuracy: +or -1 % of the full range (often within 10% to 90% of capacity). resolution: 0.1 kg/cm . operation: microprocessor-based, digital display (lcd/led) with peak hold test fluid: glycerin (approx. 98% purified). power requirement: 220v, single phase, 50 hz. memory. clamping: pneumatic or manual, often with 1/4 hp motor. fluid displacement rate: 95 + or 5 cc/minute., digital micrometer (0-25mm with least count 0.0010) (0 25 mm, 0.001 mm), digital vernier caliper (0-150mm)

Central Government/Public Sector

CTN :45467531

15 Jun, 2026 NA

Chatra - Jharkhand

Tender For supply of mandatory spares for chemical dosing skids , mandatory spares for oxygen dosing skids - drive shaft cum worm , drive worm wheel , connecting rod plate , cross head guide bush , plunger , plug , oil seal , washer , gland nut , electronic transmitter , transmitter of all type, ranges & model no. (for measurement of pressure, differential pressure flow, level, etc). , pressure transmitter , differential pressure transmitter , level transmitter , temperature element , local indicators like temperature gauges, pressure gauges, differential pressure gauges, flow gauges, flow meter etc. , pressure gauge , pressure gauge , diff. pressure gauge , process actuated switch devices includes all type of pressure, differential pressure, flow, , temperature, differential temperature, level switch devices. , process connection piping (for impulse piping/tubing, sampling piping/tubing and air supply piping , applicable) , valves of all types & models , 2 way, 3 way, 5 way valve manifolds , fitting , measuring instrument , electronic transmitters , transmitter of all type, ranges & model no. (for measurement of pressure, differential pressure flow, level, etc). , level transmitter (ultrasonic / radar type) , temperature element , local indicators like temperature gauges, pressure gauges, differential pressure gauges, flow gauges, flow meter etc. , process actuated switch devices includes all type of pressure, differential pressure, flow, temperature, differential temperature, level switch devices. , pd type flow transmitters , any other instrument (if applicable) , process connection piping (for impulse piping/ , valves of all types & models , 2 way, 3 way, 5 way valve manifolds , fitting , purge meter , filter regulators , mass flow controller , control valves actuators & accessories , pneumatic & electro-hydraulic actuator assembly , valve trim (including cage, plug, stem, seat ring, guide busing etc.) , diaphragm 'o' rings seals etc, all types of make etc. , pressure gauges of all types of make, rating, etc. , solenoid valves (if applicable) , positioner unit (complete unit) , pneumatic air filter/regulator of each type, makes rating etc. , air lock relays

Central Government/Public Sector

CTN :45452251

02 Jul, 2026 NA

Gandhinagar - Gujarat

Tender For supply of mass flow controllers (q3)

Central Government/Public Sector

CTN :45392046

29 Jun, 2026 NA

Tekanpur - Madhya Pradesh

Tender For supply of wheel distance measuring gauge as per following specn:- length: 1596 +/- 0.5mm (range 1585 to 1605mm) for meserment . accuracy : 0.1mm through vernier scale. setting : must set 90 degree to the flange . parallelism : to the main axle prospective of track level which should be indicated by the same equipment . material: hard extruted steel tube with 1.2mm thickness. fixed lug on one end spring loaded moving lug on the other end with locking system. spirit level in the center of the gauge.packing: wooden box [ warranty period: 30 months after the date of delivery ][quantity tolerance (+/-): 5 %age , item category : normal , total po value variationpermitted: max 8 lacs ] ]

Central Government/Public Sector

CTN :45372563

10 Jun, 2026 NA

Multi City - Multi State

Tender For supply of wheel distance measuring gauge as per following spec: - length: 1596 +/- 0.5mm (range 1585 to 1605mm) for measurement. accuracy: 0.1mm through vernier scale. setting: must set90 degrees to the flange. parallelism: to the main axle prospective of track level which should be indicated by the same equipment. material: hard extruded steel tube with 1.2mm thickness. fixed lug on one end spring loaded moving lug on the other end with locking system. spirit level in the centre of the gauge. make- pie, mitutoyo, cpe, iti or equivalent with calibration certificate from nabl approved lab & material test certificate to be provided. [ warranty period: 30 months after the date of delivery ]]

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis