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Tender For supply of hand held thermal imaging camera completewith 2 year warranty,technical requirement confirming to rdsoletter no.el/7.1.108/sbc/main dtd. 26/11/2024 and having irresolution: 160 x 120 pixels, digital image enhancement:yes,thermal sensitivity/netd:less than 70 mk, field of view (fov):71 degree x 56 degree , minimum focus distance: 0.3 m (0.98 ft),distance to spot ratio: 24:1, image frequency: 8.7 hz,focus:fixed, focal plane array/spectral range: uncooled microbolometer/7.5 to 14 micro mtr., detector pitch: 12 micro mtr,display resolution: 320 x 240 pixels, screen size: 2.4 inchportrait, color palettes: iron , rainbow, white hot, black hot,arctic, lava, image adjustment: automatic, image modes: msx(multi spectral dynamic imaging)visual with temperaturereading, object temperature range: -25 degree c to 380 degree c(-13 degree f to 716 degree f), measurement accuracy: -25degree c to 50 degree c (-13 degree f to 122 degree f): up toplus minus 3 degree c (plus minus 7 degree f) 50 to 100 degreec (122 to 212 degree f): plus minus 1.5 degree c (plus minus 3degree f) or plus minus 1.5% whichever is greater 100 degree cto 380 degree c (212 degree f to 716 degree f): plus minus 2.5degree c (plus minus 6 degree f) or plus minus 2.5% whicheveris greater, ir temperature resolution: 0.1 degree c (0.2 degreef), repeatability of reading: plus minus 1% of reading or plusminus 1 degree c (2 degree f), whichever is greater, responsetime: 150 ms, ir thermometer measurement: continuousscanning, minimum measurement distance: 0.26 m (0.85 ft),type-k range: included type-k probe: up to 260 degree c (500degree f), type-k accuracy: plus minus (1.0% + 3 degree c (7degree f)), spotmeter: center spot on/off, set-up commands:local adaptation of units, language, date, and time formatsscreen brightness (high, medium, low) gallery, deletion ofimages, emissivity correction: yes: 4 preset levels with customadjustment of 0.1?0.99, storage capacity on 4 gb card: 50,000images,image file format: jpeg w/ spot temp data, digitalcamera resolution: 2 mp (1600 x 1200 pixels), adapts to ir lens,flashlight: 100 lumens led, on/off option, class 1 laser: projectscenter spot and outlines circular measurement area to indicatesize, bluetooth: ble, usb: type-c: data transfer, power, batterytype: rechargeable 3.7 v li-ion battery, battery operating time: 5hrs scanning, battery charging time: 4 hrs, to 90%, powermanagement: adjustable: off, 5 min, 15 min, 30 min,shock/vibration: 25 g (iec 60068-2-27); 2 g (iec 60068-2-6),drop: designed for 2 m (6.56 ft), weight: 0.394 kg (13.9 oz),size (l x w x h): 210 x 64 x 81 mm (8.3 x2.5 x 3.2 in) make brand must be : flir-tg-268.269, bosch-gtc-400c, fluke-pti-120, testo &tipl only [ warranty period: 30 months after the date of delivery ] ]
Tender For supply of mandatory spares for chemical dosing skids , mandatory spares for oxygen dosing skids - drive shaft cum worm , drive worm wheel , connecting rod plate , cross head guide bush , plunger , plug , oil seal , washer , gland nut , electronic transmitter , transmitter of all type, ranges & model no. (for measurement of pressure, differential pressure flow, level, etc). , pressure transmitter , differential pressure transmitter , level transmitter , temperature element , local indicators like temperature gauges, pressure gauges, differential pressure gauges, flow gauges, flow meter etc. , pressure gauge , pressure gauge , diff. pressure gauge , process actuated switch devices includes all type of pressure, differential pressure, flow, , temperature, differential temperature, level switch devices. , process connection piping (for impulse piping/tubing, sampling piping/tubing and air supply piping , applicable) , valves of all types & models , 2 way, 3 way, 5 way valve manifolds , fitting , measuring instrument , electronic transmitters , transmitter of all type, ranges & model no. (for measurement of pressure, differential pressure flow, level, etc). , level transmitter (ultrasonic / radar type) , temperature element , local indicators like temperature gauges, pressure gauges, differential pressure gauges, flow gauges, flow meter etc. , process actuated switch devices includes all type of pressure, differential pressure, flow, temperature, differential temperature, level switch devices. , pd type flow transmitters , any other instrument (if applicable) , process connection piping (for impulse piping/ , valves of all types & models , 2 way, 3 way, 5 way valve manifolds , fitting , purge meter , filter regulators , massflowcontroller , control valves actuators & accessories , pneumatic & electro-hydraulic actuator assembly , valve trim (including cage, plug, stem, seat ring, guide busing etc.) , diaphragm 'o' rings seals etc, all types of make etc. , pressure gauges of all types of make, rating, etc. , solenoid valves (if applicable) , positioner unit (complete unit) , pneumatic air filter/regulator of each type, makes rating etc. , air lock relays
Tender For corrigendum : work of thermal scanning of transmission lines through high resolution infrared auto focus camara under electricity transmission circle, gorakhpur
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent massflowcontrollers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis