Simdist Tenders

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CTN :45002586

02 Jul, 2026 NA

Visakhapatnam - Andhra Pradesh

Tender For bid to ras corrigendum : supply of ht simdist and ethanol content gc equ : : - ht simdis gc and ethanol content gc , 1st yr amc visit ht simdis and ethanol gc , 2nd yr amc visit ht simdis and ethanol gc , 3rd yr amc visit ht simdis and ethanol gc , 4th yr amc visit ht simdis and ethanol gc , 5th yr amc visit ht simdis and ethanol gc

Central Government / Public Sector

CTN :45449047

03 Jul, 2026 NA

Mathura - Uttar Pradesh

Tender For corrigendum : providing of custom bid for services - 9050c26b56- annual maintenance contract of agilent make propylene gc s (3), simdist,rga and hplc for two years

Central Government/Public Sector

CTN :45694645

10 Jul, 2026 NA

Katipala - Karnataka

Tender For supply of fast dha column kit, p/n: dvi-kt-col-fdh sku, dvi-kt- col-fdh, da vinci gc as per tender specification , lt simdist cap. column 10m 0.53mm id 0.88um, p/n: dve- 185333 sku: dve- 185333_ 2025, da vinci gc , openlab gc chemstation upgr, p/n: dve- 128532 sku: dve- 128532, da vinci gc as per specificat

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

CTN :44596794

02 Apr, 2026 NA

Bangalore - Karnataka

Tender For supply of ht simdist spares : : - ht simdist cap column 5 m 0.53 mm id , sample box ref 5010 simdis ht 5pcs , sample box boiling point cal light 5pc , sample box boiling point cal heavy 5 pc , gravimetric blend lot 1 5 ml bottle , pwr cord in za c19 250v 16a 2.5m , 7693a autoinjector

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