Tender For corrigendum : supply of femtosecond laser source , multi axis cnc motion system , aberration corrected focusing optics , system integratedcontroller , in line process vision system , camor cad micromachining software , pneumatic vibration isolation system , laser power meter , consumables and essential spares kit , debris removal and exhaust system , vacuum chuck and pumping system , laser safety enclosure , machine andon or warning light , laser safety goggles , document and manuals , test pieces for machining trails , levelling and anchoring materials , packaging and forwarding
Tender For auction sale of 3-ph poly carbonate meter,metal part with porcelain (insulator),scrap empty oil barrel (serviceable)(66 kv vansda s/s),scrap 220 kv class bushing 220 kv popda ss,gi scrap- trolley, gate door,ms scrap 11 kv capacitor bank,silicon rubber insulator,gi earth wire,gi scrap iso base (66 kv valod s/s),63 kva 11kv/415 v station transformer,lead material for battery cell,metal part with porcelin,22 kv feeder panel,66 kv sri,ms scrap (rail pole piece, angle, breaker box etc),11 kv vcb panel ms scrap,battery set (66 kv pandesara b),gi tower material (66 kv talangpore-bhimrad line),22 kv ct,gi tower material,acsr zebra,scrap acsr dog conductor,control cable scrap (copper) (up to 1.1kv)- small pieces,scrap ms girder and gi hardware,earth wire,ms h frame
Tender For auction sale of depot miscellaneous scrap - pl no. 98414501scrap condemned electrical scarp such as, different sizes of battery chargers, transformers coils, contactors, inverters, control panels, residence unit, , rectifier unit, relays, float chargers, stabilizer, ips smr panel, smps ips¿ac distribution panel, sm panels boards, power supply unit, smps supervisory control unit, track feeder, tlb panel unit, mdb panel, empty electrical & signal boxes, inverters, transformers block instruments, ac dc converts, and other light fittings, empty charger box and other scrap coming under electrical scarp of sorts and sizes with or without non-ferrous attachments if any cl iii on as is where is condition available under the custody of cdms 07 ward ap.loc: behind auction hall, bin no. 1113
Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integratedcontroller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integratedcontroller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis