Latest ion pump Tenders | Government ion pump Tenders

CTN :45738439

30 Jul, 2026 NA

Indore - Madhya Pradesh

Tender For ion pump controller with cable for klystron tube

CTN :45657452

24 Jul, 2026 NA

Indore - Madhya Pradesh

Tender For sputter ion pump (sip) ~ 70 i/s with compatible sip end high voltage cable connector

CTN :45512112

24 Jul, 2026 NA

Indore - Madhya Pradesh

Tender For supply of triode sputter-ion pump with its compatible controller, hardware and essential spares

CTN :44612222

01 Jun, 2026 NA

Kolkata - West Bengal

Tender For bid to ras bid to ras corrigendum : supply of hydrophore and fresh water pump system for grse yard no 3041 orv project d d - 6m3 - hr cntrifugal,fw pump_electric motor , on board spare for 6 m3 - hr fw pump , tools for 6 m3 - hr fw pump , documentation for 6 m3 - hr fw pump , instl and comm spares for 6 m3 - hr fw pump , 1st submission of bd for 6 m3 - hr fw pump , prservatn with consumble_6m3 - hr fw pump , training for 6 m3 - hr fw pump , service engineer for 6 m3 - hr fw pump , hydrophore tank with accessories , on board spare for hydrophore tank , tools for hydrophore tank , documentation for hydrophore tank , instl and comm spares for hydrophore tank , 1st submission of bd for hydrophore tank , prservatn with consumble_hydrophore tank , training for hydrophore tank , service engineer for hydrophore tank

Central Government/Public Sector

CTN :45263257

23 Jun, 2026 NA

Delhi - Delhi

Tender For supply of uhv deposition chamber - uhv chamber specification (vacuum better than 2 10-9 mbar uhv) chamber overview spherical (diameter 14 ) or equivalent square shaped uhv chamber with support frame equipped with three (3) x 2-inch magnetron sputtering sources. all cf flanges and uhv viewports/ss blanks, three (3) x 2-inch magnetron sputtering sources. each sputtering source has an individual gas inlet line for process gases. all cf flanges., substrate holder : diameter: 2 inches; heating molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature to 1000 c without rotation. rotation: substrate holder can rotate continuously, driven by a stepper motor. variable speed from 0 to 10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to the substrate surface, tilt adjustable. two sputtering sources mounted confocally at an angle relative to the substrate. base pressure: lower than 2 10 mbar (ultra-high vacuum)., vacuum pumping system: turbo molecular pump: pfeiffer hipace300 / edwards next 300 / leybold turbovac 350i with cf100 flange or equivalent with integrated controller, ion pump with controller: included to maintain uhv vacuum levels and provide clean pumping., backing pump: pfeiffer hiscroll 12 / edwards nxds 15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves : one cf100 and one cf150 manual gate valves for isolating the chamber from the pumping systems as well as throttling, vacuum gauges and measurement: one cold cathode gauge with readout capable of measuring vacuum pressures down to1 10-10 mbar for precise uhv monitoring., one capacitance manometer gauge with measurement range from 1 10-1 to 1 10 mbar for accurate pressure reading during deposition phase, gas delivery system: two independent mass flow controllers (mfcs):a. one mfc (0-100 sccm) for argon gas feeding to all three sputtering sources via high vacuum valves.b. one mfc (0-100 sccm) for nitrogen gas feeding directly into the chamber with its own high vacuum valve.gas lines for ar and n2 are physically separated to avoid cross-contamination., chamber access and viewports: 1. two view ports installed on the chamber, each equipped with manual shutters. 2. access ports for gauges, pump, gas inlet and few spares for future upgradation., baking capability: entire chamber designed to bake-out at 150 c to reduce contamination and out gassing during operation, cooling capability : water manifold with flow switch / flow meters, near uhv chamber specification: chamber overview: spherical (diameter 14 ) or equivalent square shaped uhv chamber with stand., three 2-inch magnetron sputtering sources, each with individual gas inlet. all cf flanges and uhv viewports/ss blanks., substrate holder: a. diameter: 2inches; heating : molybdenum heater capable of heating substrate (a) from room temperature (rt) to 800 c during rotation and (b) from room temperature (rt) to 1000 c without rotation b. rotation : substrate holder driven by stepper motor. variable speed from 0 to10 rpmmovement: up / down vertical movement of total 25mm to adjust substrate position during deposition sputtering geometry: one sputtering source mounted parallel to substrate surface (tilt able preferred). two sputtering sources mounted confocally at an angle. base pressure : lower than 5 10 mbar (near uhv)., vacuum pumping system: turbo molecular pump : pfeiffer hipace 700 / edwards next 730 / leybold turbo vac 900 ix or equivalent with cf100 flange and integrated controller, suitable for near uhv vacuum., backing pump: pfeiffer hi scroll 12/edwards nxds15i / leybold scroll vac 15 plus or equivalent dry scroll pump used to back tmp, gate valves: one cf150 manual gate valve to isolate / throttle chamber from pumping system, vacuum gauges and measurement: cold cathode readout capable of dis

Central Government/Public Sector

CTN :45238744

10 Jun, 2026 NA

Gandhinagar - Gujarat

Tender For supply of ion pump of 300 liter per second or higher

CTN :44010340

07 May, 2026 NA

Mumbai - Maharashtra

Tender For bid to ras supply of mini ion pump uhv controller , cable assembly to connect uhv controller to pump , star cell sputter ion pump 27lps

Central Government/Public Sector

CTN :44593371

27 Apr, 2026 NA

Porbandar - Gujarat

Tender For bid to ras corrigendum : procurement of hydrophore/ fresh water pump (make: rgb4, 2tph, model: best & cromption; qty: 02 no's

CTN :44225263

24 Apr, 2026 99.8 Thousand

Kalpakkam - Tamil Nadu

Tender For bid to ras supply of sputter ion pump power supply control pcb b b -sputter ion pump power supply control pcb , sputter ion pump power supply control pcb. , sputter ion pump , sputter ion pump 4 to 20ma output pcb

Central Government/Public Sector

CTN :43085828

09 Apr, 2026 NA

Goa - Goa

Tender For bid to ras corrigendum : statement of technical requirement for preperation of ietm document for ship system and integration of equipment ietm by ietm integrator. - main engine, gear box, stern gear system, diesel alternator with accessories, steering gear, fin stabilizer, ac plant, stp/vts, lo centrifuge, fo centrifuge, salvage pump, fire pump, bilge pump, ro plant, fresh water pump and hydrophore tank, ows, hp air cylinder, ref plant, high pressure air compressor (dd), high pressure air compressor (md), fo transfer pump (gear pumps), lo transfer pump (gear pumps), magazine fire fighting system, fm 200 fire fighting system, dirty oil pump, ba charging compressor with accessories, avcat pump, avcat filter water seperator & wbf, fuel oil stripping pump, diesel driven fire pump, emergency da, iccp & asg, afac, advanced composite communication system (accs), lan system, mbsre & intercom, msb, apms, nlcp, sicads, sirs, sp telephone, sdn, srgm, srcg, tacan, trigun, uwt, v/uhf comint df search receiver (nayan), xbt, ipms, window wiper, hvlas, hdcs, uass, hvac equipment, hangar door, asist/nghhts, store lift, anchor capstan

Ion Pump Tenders

By Cities

By States

By Agencies

By Ownerships

By Sectors

Central Government/Public Sector

Central Government/Public Sector

Central Government/Public Sector

Central Government/Public Sector